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Semiconductor
Semiconductor
Plating processes  
      for semiconductor

Copper
Tin/Lead
Tin/Silver
Galv. Nickel
Galv. Gold
E-less Nickel
Palladium

Ni-ancolyzer
Online Control of Galvanic Ni-Bath

Product brochure Ni-ancolyzer (PDF, 74 KB)

Overview

Analyzing Nickel, Boric Acid, Chloride, Wetting Agent and pH

ancosys Ni-ancolyzer includes several titration, surface tension and pH-measurement in order to analyze an electroless nickel bath. It confirms consistent chemical conditions for each wafer.

The system allows to take samples from up to 4 slipstreams (additional as option) plus a manual sample. The analysis of each sample is executed simultaneously to optimize the analyzing time.

Total analytic time is 30 min per tank.

The open ancolyzer technology platform allows expanding the functionalities in analytics, replenishment and communication.